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PURMS – Ungluing preparations for photoresist

PURMS-IMAGE

Ungluing preparations for photoresist
Recycable, economical and environmental frendly.

Compare with existing Ungluing preparations for photoresist

The new PURMS photoresist removal agent is safer and more environmentally friendly than other amine-solvent mixtures. Degrated Purms with melted photoresist can be regenerated by ozone. Also recycling device can be installed with wet system.

Existing photoresist removal solvents comparison with PURMS

organic solvent Monoeth-
anolamine
(MEA)
Dimethyl
sulfoxide
(DMSO)
N-Methylp-
yrrolidone
(NMP)
PURMS
Boiling point(℃) 171 189 202 220
Melting point.(℃) 10.5 18.5 -24 19
Specific gravity 1.11(20℃) 1.09(25℃) 1.03(25℃) 1.21(40℃)
Surface tension
(dvn/cm)
45.6(50℃) 42.8(25℃) 41.0(25℃) 4.9(23℃)
Coefficient of viscosity(cp) 2.3(90℃) 2.0(25℃) 1.65(25℃) 2.36(25℃)
Steam pressure
(mmHg)
6.7(65℃) 5.1(56℃) 4.0(60℃) 0.15(20℃)
Smell(room temperature) Amine-like odor scentless Slight amine-like odor scentless
Flash point(℃) 93 95 95 Over 136
Fire Service Act Petroleum 3rd class 4th Petroleum 3rd class 4th Petroleum 3rd class 4th designated combustibles
flammable liquid
Toxicity
RAT LD50
(oral administration)
21g/kg 18g/kg 7g/kg 8g/kg
Ozone reaction Reacting Reacting Reacting Almost non-reacting
Other specs Strong hygroscopicity Strong hygroscopicity Strong hygroscopicity Weak hygroscopicity

Advantages of PURMS

There is almost no damage inflicted on metal film. In addition, Purms can be recycled by ozone so that you are able to reduce organic wastes.

Metal film Al Cu W
Damage <0.3A <0.11A <0.35A

*120℃ immersing in PURMS in 10 mins

Fields of possible use and potential application

Lift-off device
There is almost no damage inflicted on metal film. In addition, device recycle possibility results in lesser amounts of organic waste.
Coater cup solvent cleaner
Effectively removes smudges from coater cups. Recycled ozone reacts with photoresist, decomposing it and positively affecting the solvent’s longevity.
Photoresist films removal agent
PURMS photoresist solution is safer than existing photoresist strippers. It also provides recycle possibility.
Photoresist films removal agent for liquid crystal production
There is almost no damage inflicted on metal film. In addition, device recycle possibility results in lesser amounts of organic waste and lowers the maintenance expenses.

Anti-static additives for liquid crystal production

Anti-static additives for liquid crystal production-IMAGE

Anti-static additives
for liquid crystal glass circuit boards

Renatech AC-1 series is a product of Renactech and Toshiba collaboration effort, designed to enhance the outdated charging liquid crystal production processes. AC-1 has dramatically improved yield rate of LC products, especially the TFT LC production line, and now is widely used by many other electronic industries. Free sample is readily available – please do not hesitate to contact us.

AC-1

Ultra-high purity product for application which requires highest cleanness level for manufacturing products such as semi-conductors.

Packaging Unit 5 Liter, Plastic Container
Concentration 5%solution
Practical concentration 0.5%-0.2%
Dilute with deionized water
Unit price 12,000JPY/kg
Price 60,000JPY/Container

Market price

Sample price

Concetration/0.5% 1L
Price 1,000JPY (including shipping and packaging fees)

Anti-static effectiveness in FDP production line

Changes of electrical potential on cerface of circuit boards

Changes of electrical potential on cerface of circuit boards

Other usages

Semiconductor, liquid crystal and other electronical industries.

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